Influence of hydrogen plasma processing on gas-sensitive tin dioxied thin film properties

Igor A. Karapatnitski, K.A. Mit’, Д.М. Мухамедшина, Grigory G. Baikov

2000

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DOI 10.1117/12.408464
Data confidence 70 medium
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Abstract

The influence of glow discharge hydrogen plasma processing on undoped tin dioxide (SnO2) thin film structure and properties have been investigated. The films of 150 - 200 nm thickness were deposited by a method of magnetron sputtering on Al2O3 substrate at the temperature of this one 250 degree(s)C with a rate of 1.5 - 2.0 nm/min in argon-oxygen mixture atmosphere. It was shown these films are amorphous just after fabrication, theirs polycrystalline structure appears after annealing and disappears after processing in the hydrogen plasma. Such a processing expands a temperature range of film sensitivity to ethanol and heptane vapors, increases the sensitivity to low concentration of those.