Abstract
The influence of treatment by glow discharge hydrogen and oxygen plasma on properties of undoped SnOxthin films has been studied. Films of ∼ 350−400 nm thick have been deposited on a glass substrate by magnetron sputtering in an argon-oxygen atmosphere. The dependences of structural, electrical and optical properties of SnOx films on plasma processing time have been investigated. The results are discussed in terms of SnOx thin films microstructure.