APMP key comparison for the 10 MΩ and 1 GΩ resistance

Kwang Min Yu, Wan Seop Kim, Kwon Soo Han, Jimmy Chun-Ming Hsu, Chiwat Jessadajin, Nirul Irwani Ishak, Zhou Yinzhu, Nobu‐Hisa Kaneko, B.J. Pritchard, Alexander Matlejoane

5 more authors

Liang Bo, Yuri P. Semenov, Brenda H. S. Lam, Danat Termikhanov, Laurie A. Christian

2014

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DOI 10.1109/cpem.2014.6898378
Data confidence 70 medium
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Abstract

A key comparison for the 10 MΩ and 1 GΩ resistance, APMP.EM-K2, has been carried out by the Asia-Pacific Metrology Program(APMP) Regional Metrology Organization(RMO). The purpose is to establish the degree of equivalence of resistance among the national metrology institutes(NMIs) within APMP, in support of CIPM Mutual Recognition Agreement(MRA). The key comparison artifacts are three 10 MΩ and three 1 GΩ resistance standards which was loaned from NIST and the 13 NMIs were participated in the comparison. The results will be presented at the conference.