Influence of treatment in the (O2,H2) plasma on the structure and physical properties of SnO x films

Н. Б. Бейсенханов

2011

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DOI 10.1134/s1063783411020041
Data confidence 70 medium
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Abstract

The influence of treatment in hydrogen and oxygen glow discharge plasmas on the structural and optical properties of 270- to 350-nm-thick SnO x films prepared using magnetron sputtering and the sol-gel method on the glass substrate has been considered. It has been demonstrated that the plasmas exert segregating and destroying effects on the structure of crystal grains, the transparency of films, and on their porosity. It has been established that treatment in the hydrogen glow discharge plasma makes it possible in principle to prepare crystal-amorphous nanostructures in which tin oxide nanocrystals of high quality alternate with tin oxide clusters.