Abstract
The local structure of amorphous As–Se films prepared by thermal evaporation in a vacuum and by RF ion-plasma sputtering, two techniques strongly differing in the conditions of substance vaporization and condensation of atoms on a substrate, was studied by Raman spectroscopy. It was found that the local structure of the films varies. A conclusion was drawn that the differences in local structure between the films are stipulated by the fact that the matrix of the films obtained by ion sputtering contains, along with the structural units common to films deposited by the two methods, other structural units.