High sensitive NH 3 sensor based on electrochemically etched porous silicon

2020

Full text Open access: Gold Metadata (CSL-JSON)
DOI 10.1080/23311916.2020.1810880
Data confidence 70 medium
How this score is calculated

It is built from checkable properties of the record itself: whether the article has a DOI, how many independent sources confirmed its data, whether the required fields are filled in, and how recent the latest confirmation is. Disagreement between sources and a missing identifier lower it. A value of 80 or above means the record was published without further checking; 60 to 79 means it is published at reduced confidence, with a manual check advisable. A record verified by an editor by hand is never pushed below 90 by a recalculation. This scores our data about the article, not the article itself.

Abstract

In the current study, porous silicon (por-Si) samples were fabricated by electrochemical etching at different times (20 min, 40 min, 60 min). Scanning electron microscope (SEM) images of horizontal cross-sections of the samples showed the formation of pores. The etched samples’ porosity was determined by the gravimetric method and amounted to 59.5%, 72.7%, 83.3%, respectively. Optical characteristics such as Raman spectra and photoluminescence (PL) spectra were obtained. The current-voltage and capacitance-voltage characteristics were also measured to calculate the sensitivity of the samples. The study results show that sample, which is etched for 40 minutes has a maximum response value to ammonia (NH3) gas than others, and the sensitivity is 33.25. The results demonstrated that it is possible to develop a high sensitive sensor device based on por-Si for determining NH3 gas in concentrations below 0.1 ppm at room temperature.