Optical studies of nanocrystalline and amorphous TiO2 thin films deposited by HiTUS technique

Andrzej Kociubiński, I.P. Studenyak, O.T. Nahusko, Vitalii Yu. Izai, Mladen Kranjcec, Peter Kúš, Marián Mikula, Kanat Mussabekov

2018

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DOI 10.1117/12.2501508
Data confidence 70 medium
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Abstract

TiO2 thin films were deposited on glass substrates by HiTUS (high target utilization sputtering) technique. Structural studies of TiO2 thin films of different thickness were performed by X-ray diffraction. Refractive index and extinction coefficient were measured by spectroscopic ellipsometer. Transmission spectra of TiO2 thin films were investigated in the temperature interval 77-300 K. The temperature behaviour of Urbach absorption edge for TiO2 thin film was studied. The effect of temperature on the optical parameters and order-disorder processes in TiO2 thin films was analysed.