Abstract
Nanocompositefilms Nb-Al-N produced by magnetron sputtering were researched in this work. Two stable crystalline structural states were found in the films: NbN ch and solid solution B1-Nb x Al 1-x N y O 1-y , and also an amorphous component associated with aluminum oxynitride with reactive magnetron sputtering. Sensitivity of substructural characteristics was set up to the current supplied to Al target and their relationship with the characteristic nanohardness and Knoop hardness. Recent changes in the range of 29-33.5 GPa and 46-48 GPa, respectively. Initial principle calculations of phases NbN and Nb 2 AlN and also heterostructures of NbN/AlN were carried out for the interpretation of the results. The work was performed as a part of two complex state programs: "Development of nanostructured superhard coatings formation foundations with high physical-mechanical properties" (number 0112u001382) and "Physical principles of plasma technologies for complex processing of multicomponent materials and coatings" (number 0113u000137c).