Abstract
The influence of glow discharge hydrogen plasma treatment on undoped tin dioxide thin films has been studied. The films with thickness of ∼ 350 nm have been prepared by a method of magnetron sputtering in argon-oxygen atmosphere on glass substrate. Temperature of the substrate was 200 °C. It has been shown that these films were amorphous just after fabrication; their polycrystalline structure was formed during annealing and it was worsened after processing in the hydrogen plasma. The dependences of structural and optical properties of SnOx films from various regimes of treatment by hydrogen plasma and the annealing in air at temperature of 550 °C have been investigated. The values of optical parameters, density and porosity of SnOx films after different regimes of treatment were found. Correlation between the structural and optical properties of tin oxide films is discussed.