Abstract
This paper presents the results of the study of carbon films deposited on substrates of quartz, mica and silicon by the method of electron paramagnetic resonance (EPR). This study has identified the dependences of the intensities of the EPR signal, the g- factor, and the line width on the temperature of carbon films on various substrates with perpendicular and parallel arrangement of the sample plane relative to the orientation of the magnetic field are presented. The results of this study show that the dependence of the line width on temperature measurements does not change under both conditions for recording the EPR spectra. The research has also shown that with increasing temperature, the normalized intensity of the EPR signal line increases when carbon is deposited on various substrates (quartz, mica, and silicon) by the method of plasma decomposition of a mixture of CH4 and H2.