Investigation of Synthesis of Carbon Nanowalls by the Chemical Vapor Deposition Method in the Plasma of a Radio Frequency Capacitive Discharge

2019

Closed access Metadata (CSL-JSON)
DOI 10.1109/tps.2019.2903145
Data confidence 70 medium
How this score is calculated

It is built from checkable properties of the record itself: whether the article has a DOI, how many independent sources confirmed its data, whether the required fields are filled in, and how recent the latest confirmation is. Disagreement between sources and a missing identifier lower it. A value of 80 or above means the record was published without further checking; 60 to 79 means it is published at reduced confidence, with a manual check advisable. A record verified by an editor by hand is never pushed below 90 by a recalculation. This scores our data about the article, not the article itself.

Abstract

In this paper, the synthesis of carbon nanowalls (CNWs) by the chemical vapor deposition method in the plasma of a radio frequency (RF) capacitive discharge is considered. The so-called “CNWs” are one of the allotropes of carbon, which are interesting from both the practical and theoretical points of view. Because of their large surface, CNWs are a perfect electrode material for electronic devices. CNWs were synthesized at relatively low values of RF power, and it was found that an increase in the discharge power caused a decrease in the height of CNWs and an increase in their thickness. The study of graphitization of the CNW structure showed that synthesized CNWs had a low number of defects in the structure. The obtained results could be useful for the low-cost production of CNWs by the plasma-enhanced chemical vapor deposition (PECVD) method.