Abstract
This study investigates the effect of gold ion (Au⁻) implantation with an energy of 60 keV and a fluence of 1×10¹⁷ ions/cm² on the structural and phase state of multilayer (TiAlSiY)N/CrN coatings deposited by magnetron sputtering. To perform a comprehensive analysis, grazing incidence X-ray diffraction (GIXRD), high-resolution transmission electron microscopy (HRTEM), secondary ion mass spectrometry (SIMS), Rutherford backscattering spectrometry (RBS), and SRIM simulation of ion range were employed. The ion implantation led to the amorphization of the near-surface layer (~20 nm thick), a reduction in crystallite size from ~8 nm to 4-5 nm, and blurring of the multilayer boundaries. A significantly higher sputtering yield of nitrogen – 3-4 times greater than that of Ti and Al – was identified, resulting in local non-stoichiometry and redistribution of alloying elements such as Si and Y. The modeling results and experimental data correlate well, revealing substantial degradation of the initial crystalline structure within the implantation zone. These findings may contribute to the development of radiation-resistant, wear-resistant, and thermally stable protective coatings designed for operation under high-energy irradiation, thermomechanical loads, and aggressive environments.