Аннотация
Abstract Thin TiO2-based foils with a thickness of 620 nm were obtained using magnetron sputtering. The samples were irradiated with 85-MeV Fe7+ ions with a fluence of 1 × 1011 to 1 × 1014 ion/cm2. The dose dependence of changes in the concentration of defects in the structure of the thin films was determined. It was established that an increase in the crystal lattice parameters and a decrease in the density due to the formation of disorder regions and displaced atoms in the structure leads to a change in interplanar distances and an increase in deformation and stresses in the crystal lattice structure.