Аннотация
Addressing corrosion and wear in assemblies, components, machine parts, and equipment operating in aggressive environments under severe wear conditions remains a pressing challenge and continues to draw focused scientific attention. This work aimed to investigate how the key magnetron sputtering parameters (working pressure, plasma current, and process-gas flow rates) affect the surface morphology, microstructure, and composition of TiN and CrN films deposited under different conditions. Microstructural analysis revealed that, across the investigated parameter window, the films exhibit a columnar cross-sectional architecture and a smooth surface morphology with no visible defects, showing no pronounced differences between the deposition regimes. After 30 min of deposition, the film thickness ranged from 0.17 to 0.46 μm for TiN and from 0.59 to 3.46 μm for CrN, depending on the sputtering conditions. The results demonstrate that plasma current and working pressure have a strong effect on film thickness and chemical composition, whereas variations in the working-gas flow rate exert a coupled influence on thickness, microstructure, and the stoichiometry of TiN and CrN layers. Elemental analysis further indicates that increasing the pressure to 0.65 Pa increases oxygen incorporation in the films. During chromium sputtering, raising the plasma current to 1.5 A leads to film delamination. For TiN, a balanced regime with a moderate N2 flow is preferable, providing a reasonable growth rate and a composition close to stoichiometric. For CrN, the range of stable operating conditions is substantially broader, and the process parameters have a more pronounced impact on its structure and composition. These findings can support the design of TiN/CrN wear-resistant multilayer coatings produced by magnetron sputtering for protecting machine parts and equipment against wear and corrosion.