Аннотация
Abstract In this work, the results of SiO x thin film deposition by an atmospheric pressure plasma jet using HMDSO (hexamethyldisiloxane) as precursor are presented. The experiments were performed for different process parameters like initial applied power, substrate to nozzle distance and speed of the moving substrate holder. In order to determine the properties of deposited films the samples were analyzed by scanning electron microscopy, transmission electron microscopy, atomic force microscopy and profilometer. The formation mechanism of particles and their size distribution depending on the process parameters are described and discussed. The results show the possibility to change properties of deposited films and particle formation by tuning the experimental settings.