Аннотация
Nanostructured films based on TiO2 with a thickness of 620 nm were obtained by magnetron sputtering. The samples were irradiated at the DC-60 heavy ion accelerator of the Astana branch of the Institute of Nuclear Physics with Fe7+ ionswith an energy of 85 MeV at the fluence of 1×1011 to 1×1014 ions/cm2. The dependences of the change in defects concentration in the structure of thin films from the irradiation dose are established. A decrease in intensities of diffraction peaks indicates an increase in microdistortions in the structure, as well as the formation of regions of disorder. Evaluation of the effect of irradiation on amorphization and destruction of the crystal structure was carried out using a modified Griffiths criterion. It has been established that a decrease in the degree of crystallinity as a result of irradiation leads to the formation of amorphous inclusions in the structure and a decrease in the radiation resistance of thin films.