Аннотация
In this work, studies have been carried out on the synthesis of coatings based on hafnium and carbon, using the method of ion-plasma spraying of coatings from alternating layers of hafnium and carbon with a thickness of each layer less than 1 nm. When performing the work, we used a four-channel magnetron setup. In which two oppositely located magnetrons were used. One magnetron is charged with a hafnium target, and the other magnetron is charged with a carbon target. The rate and optimal modes of sputtering of hafnium and carbon have been determined. The dependences of the amount of atomized hafnium and carbon on the power applied to the magnetron are obtained. The average atomization power of hafnium has been determined, which corresponds to the removal of the substance with the removal of carbon at its maximum possible atomization power. The synthesis of hafnium-carbon coatings in the concentration range from 59.8 to 5.3 at.%. Carbon was carried out, and X-ray studies of carbide coatings were performed. Determined in the hafnium-carbon system formed by magnetron deposition, at concentrations from 59.8 to 26.1 at. % carbon in the coating, the cubic phase of hafnium carbide is formed, with a decrease in the lattice parameter. At a concentration of 16.2 at. % carbon, along with the cubic phase of hafnium carbide, hafnium with a hexagonal structure begins to precipitate in the coating. With a further decrease in the carbon concentration in the coating, the hexagonal phase of hafnium becomes predominant.